Very high performance and manufacturable 3.3 V 0.35-μm CMOS technology for ASICs

Proceedings of the Custom Integrated Circuits Conference

Volumn , Issue , 1996, Pages 31-34

  Kizilyalli, I C ^a   Lytle, S A ^a   Jones, B R ^a   Martin, E P ^a   Shive, S F ^a   Brooks, A L ^a   Thoma, M J ^a   Schanzer, R W ^a   Sniegowski, J W ^a   Wroge, D M ^a   Key, R W ^a   Kearney, J W ^a   Stiles, K R ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPLICATION SPECIFIC INTEGRATED CIRCUITS; ELECTRONICS PACKAGING; GATES (TRANSISTOR); INTEGRATED CIRCUIT MANUFACTURE; OPTIMIZATION; OSCILLATORS (ELECTRONIC);

DEVICE SCALING; GATE OXIDE; INTERCONNECT DESIGN RULES; POLYSILICON GATE; RING OSCILLATOR;

CMOS INTEGRATED CIRCUITS;

EID: 0029713506     PISSN: 08865930     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)