Reactive gas-controlled arc process

International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV

Volumn 2, Issue , 1996, Pages 957-961

  Rogozin, A F ^a   Fontana, R P ^a  

^a Multi Arc Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; AUGER ELECTRON SPECTROSCOPY; CATHODES; CRYSTAL DEFECTS; EMISSION SPECTROSCOPY; FILM PREPARATION; HARDNESS; MELTING; PLASMAS; SCANNING ELECTRON MICROSCOPY; VACUUM APPLICATIONS;

CATHODE MATERIALS; CATHODE POISONING; CATHODIC VACUUM ARC DEPOSITION; DEPOSITION RATE; INTEGRAL CATHODE SURFACE TEMPERATURE; JARREL ASH OPTICAL SPECTROMETER; MACROPARTICLES; MELTING POINT; OPTICAL EMISSION SPECTROSCOPY; REACTIVE GAS CONTROLLED ARC;

DEPOSITION;

EID: 0029713387     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)