The effect of silicon and phosphorus on the degradation of poly(methyl methacrylate)

Polymer

Volumn 37, Issue 14, 1996, Pages 2963-2968

  Chang, T C ^a   Chen, Y C ^b   Ho, S Y ^b   Chiu, Y S ^c  

^a NATIONAL DEFENSE UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^c CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Degradation; Phosphorylated; Poly(methyl methacrylate)

Indexed keywords

ACTIVATION ENERGY; BLOCK COPOLYMERS; COMPOSITION EFFECTS; COMPUTATIONAL METHODS; COPOLYMERIZATION; FREE RADICAL POLYMERIZATION; MONOMERS; PHOSPHORUS COMPOUNDS; PYROLYSIS; SILICON COMPOUNDS; THERMODYNAMIC STABILITY; THERMOGRAVIMETRIC ANALYSIS;

OZAWA METHOD; PHOSPHORYLATION; POLYDIMETHYLSILOXANE POLYMETHYL METHACRYLATE BLOCK COPOLYMERS;

POLYMETHYL METHACRYLATES;

EID: 0029713260     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/0032-3861(96)89392-X     Document Type: Article

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