Three-dimensional additive electron beam lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2780, Issue , 1996, Pages 388-395

  Koops, Hans W ^a   Weber, M ^a   Schossler, C ^a   Kaja, A ^a  

^a DEUTSCHE TELEKOM LABORATORIES   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY MEASUREMENT; NANOSTRUCTURED MATERIALS; OPTICAL MATERIALS; SCANNING ELECTRON MICROSCOPY; THREE DIMENSIONAL; TRANSMISSION ELECTRON MICROSCOPY; X RAY ANALYSIS;

DISPERSIVE ENERGY X RAY ANALYSIS; ELECTRON BEAM INDUCED DEPOSITION; NANOCRYSTALLINE MATERIALS; THREE DIMENSIONAL LITHOGRAPHY;

ELECTRON BEAM LITHOGRAPHY;

EID: 0029710728     PISSN: 0277786X     EISSN: None     Source Type: None    
DOI: 10.1117/12.238195     Document Type: Conference Paper

References (15)