Crystalline structure and composition of tin oxide film grown by reactive ion assisted deposition as a function of average irradiating energy

Materials Research Society Symposium - Proceedings

Volumn 396, Issue , 1996, Pages 617-622

  Choi, W K ^a   Song, S K ^a   Cho, J S ^a   Jung, H J ^a   Koh, S K ^a  

^a Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; AUGER ELECTRON SPECTROSCOPY; CRYSTAL STRUCTURE; DEPOSITION; FILM GROWTH; GLASS; ION BEAMS; OPACITY; OXIDES; SILICON; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

AVERAGE IMPINGING ION ENERGY; CHEMICAL SHIFT; KINETIC ENERGY; REACTIVE ION ASSISTED DEPOSITION;

TIN COMPOUNDS;

EID: 0029710629     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (23)