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Volumn , Issue , 1996, Pages 126-130
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Thickness mapping of thin dielectrics with emission microscopy and conductive atomic force microscopy for assessment of dielectrics reliability
a
a
SIEMENS AG
(Germany)
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
ELECTRIC CURRENT DISTRIBUTION;
ELECTRON TUNNELING;
LEAKAGE CURRENTS;
MICROSCOPIC EXAMINATION;
OXIDES;
RELIABILITY;
THICKNESS MEASUREMENT;
THIN FILMS;
EMISSION MICROSCOPY;
FOWLER-NORDHEIM CURRENT DISTRIBUTION;
THICKNESS MAPPING;
DIELECTRIC MATERIALS;
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EID: 0029708979
PISSN: 00999512
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/relphy.1996.492072 Document Type: Conference Paper |
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Times cited : (1)
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References (9)
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