Semiconductor epitaxial and nonepitaxial overgrowth from solutions

Materials Research Society Symposium - Proceedings

Volumn 399, Issue , 1996, Pages 189-194

  Koehler, R ^a   Raidt, H ^a   Banhart, F ^a   Jenichen, B ^a   Gutjahr, A ^a   Konuma, M ^a   Silier, I ^a   Bauser, E ^a  

^a Roentenbeugung ^*  (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; ELECTRON MICROSCOPY; EPITAXIAL GROWTH; ETCHING; LIQUID PHASE EPITAXY; MORPHOLOGY; OPTICAL MICROSCOPY; SEMICONDUCTING SILICON; SILICON ON INSULATOR TECHNOLOGY; SUBSTRATES; X RAYS;

EPITAXIAL LATERAL OVERGROWTH; NONEPITAXIAL OVERGROWTH; SEMICONDUCTOR LATERAL GROWTH; SOLUTION GROWTH; THIN SEMICONDUCTOR LAMELLAE; X RAY TOPOGRAPHY;

SEMICONDUCTOR GROWTH;

EID: 0029707047     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)