Thin Mo films deposited and analyzed using sub-keV noble gas ions

Materials Research Society Symposium - Proceedings

Volumn 396, Issue , 1996, Pages 587-592

  van Der Kuur, Jan ^a   Melker, Ernst Jan E ^a   Huijgen, Tom P ^a   Hoondert, Wilbert H B ^a   Bekking, Gerard T W M ^a   van den Beukel, Arie ^a   Thijsse, Barend J ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ARGON; DEPOSITION; FILM GROWTH; HELIUM; ION BEAMS; ION BOMBARDMENT; MOLYBDENUM; POINT DEFECTS; THIN FILMS;

ATOMIC MOBILITY; DEFECT ANNIHILATION; DEFECT CREATION; POLYVACANCIES; THERMAL DEPOSITION; THERMAL DESORPTION SPECTROMETRY;

METALLIC FILMS;

EID: 0029705610     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)