Use of neural networks for LPCVD reactors modelling

Computers and Chemical Engineering

Volumn 20, Issue SUPPL.1, 1996, Pages

  Fakhr Eddine, K ^a   Cabassud, M ^a   Duverneuil, P ^a   Le Lann, M V ^a   Couderc, J P ^a  

^a LABORATOIRE DE GÉNIE CHIMIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; COMPUTER SIMULATION; CONTROL EQUIPMENT; FILM PREPARATION; NEURAL NETWORKS; PRODUCTION CONTROL; THICKNESS CONTROL;

CHEMICAL VAPOR DEPOSITION;

EID: 0029703761     PISSN: 00981354     EISSN: None     Source Type: Journal    
DOI: 10.1016/0098-1354(96)00096-8     Document Type: Article

References (6)

1. Azzaro, C., Duverneuil, P. and Couderc, J.P., 1992, Thermal and kinetic modelling of low-pressure chemical vapour deposition hot-wall tubular reactors, Chem. Engng Sci. 47, 3827-3838.
2. Dennis, J. E., Jr., and Schnabel, R. B., 1983, Numerical methods for unconstrained optimization and nonlinear equations, Prentice-Hall, Englewood Cliffs, New Jersey.
3. Morris, A.J., Montague, G.A. and Willis, M.J., 1994, Artificial neural networks : studies in process modelling and control, Trans IChem. 72, 3-19.
4. Press, H.W., Flannery, B.P., Teukosky, S.A. and Vetterling, W.T., 1988, Numerical recipes, The art of scientific computing, Cambridge University Press, London.
5. Rumelhart, D.E., Hinton, G.E. and Williams, R.J., 1988, Learning representations by back-propagating errors, Nature 325, 533-536.
6. Thibault, J., and Grandjean, B. P. A., 1991, A neural network methodology for heat transfer data analysis, Int. J. Heat Mass Transfer 34, 2063-2070.