Assessment of charge-induced damage from high density plasma (HDP) oxide deposition

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1996, Pages 67-70

  Krishnan, Srikanth ^a   Nag, Somnath ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; ELECTRIC CHARGE; GATES (TRANSISTOR); LEAKAGE CURRENTS; MOSFET DEVICES; OXIDES;

CHARGE INDUCED DAMAGE; HIGH DENSITY PLASMA; INTERLEVEL DIELECTRIC; POLYMETAL DIELECTRIC;

PLASMA APPLICATIONS;

EID: 0029702805     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)