Optically addressed spatial light modulator with highly sensitive layer of amorphous hydrogenated silicon carbide

Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals

Volumn 282, Issue , 1996, Pages 315-322

  Ivanova, N L ^a   Feoktistov, N A ^a   Chaika, A N ^a   Onokhov, A P ^a   Pevtsov, A B ^a  

^a S I VAVILOV STATE OPTICAL INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; DECOMPOSITION; DIFFRACTION; ELECTRIC CONDUCTIVITY; NEMATIC LIQUID CRYSTALS; OPTICAL RESOLVING POWER; PHOTOSENSITIVITY; SILICON CARBIDE;

DARK RESISTIVITY; GAS MIXTURE; LIGHT INTENSITY; OPTICAL RESPONSE; PHOTOADDRESSED SPATIAL LIGHT MODULATOR; PHOTORECEPTOR; PLASMA DECOMPOSITION; TRANSMITTANCE;

LIGHT MODULATORS;

EID: 0029699235     PISSN: 1058725X     EISSN: None     Source Type: Journal    
DOI: 10.1080/10587259608037585     Document Type: Article

References (3)

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2. K. Ahiyama, A. Takimoto, H. Ogawa, Appl.Qpt., 32, pp. 6493-6500, (1993).
3. P.R. Ashley, J.H. Davis, T.K. Oh, Appl. Opt., 27, pp. 1797-1802, (1988).