Impact of the residual facet reflectivity on beam profile filamentation in semiconductor laser amplifiers

Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS

Volumn , Issue , 1996, Pages 416-417

  Dai, Zheng ^a   Michalzik, Rainer ^a   Unger, Peter ^a   Ebeling, Karl Joachim ^a  

^a UNIVERSITY OF ULM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; ELECTRIC CURRENTS; ITERATIVE METHODS; LASER BEAMS; LIGHT EMISSION; LIGHT PROPAGATION; LIGHT REFLECTION; OPTICAL PROPERTIES; OPTICAL WAVEGUIDES; PERFORMANCE; SEMICONDUCTOR QUANTUM WELLS;

BEAM PROFILE FILAMENTATION; BEAM PROPAGATION METHOD; CARRIER DIFFUSION; CURRENT SPREADING; RESIDUAL FACET REFLECTIVITY;

SEMICONDUCTOR LASERS;

EID: 0029698103     PISSN: 10928081     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (3)