Modification of magnetron sputtered a-Si1-xCx:H films by implantation of Sn+

Materials Research Society Symposium - Proceedings

Volumn 396, Issue , 1996, Pages 243-248

  Tzenov, N ^a   Dimova Malinovska, D ^a   Tsvetkova, T ^a  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CHEMICAL MODIFICATION; ELECTRONIC PROPERTIES; GRAPHITE; INFRARED SPECTROSCOPY; ION IMPLANTATION; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; SILICON; SILICON CARBIDE; TIN; X RAY PHOTOELECTRON SPECTROSCOPY;

ABSORPTION EDGE SHIFT; AMORPHOUS SILICON CARBIDE HYDROGENATED FILMS; BAND GAP; BOND CONFIGURATION; OPTICAL EFFECT; RADIO FREQUENCY MAGNETRON SPUTTERING;

AMORPHOUS FILMS;

EID: 0029697094     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (18)