Digital imaging of the effect of photoetching on the photoresponse of n-type tungsten diselenide and molybdenum diselenide single crystal electrodes

Journal of Physical Chemistry

Volumn 100, Issue 2, 1996, Pages 760-768

  Salvador, P ^a,c   Chaparro, A M ^a   Mir, A ^b  

^a INSTITUTO DE CATÁLISIS Y PETROLEOQUÍMICA   (Spain)

^b Department of Physics   (Spain)

^c UNIVERSITAT DE LES ILLES BALEARS   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; ETCHING; IMAGING TECHNIQUES; MOLYBDENUM ALLOYS; PHOTOCHEMICAL REACTIONS; PHOTOELECTROCHEMICAL CELLS; SINGLE CRYSTALS; TUNGSTEN ALLOYS;

DIGITAL IMAGING; INTENSITY MODULATED PHOTOELECTRON SPECTROSCOPY (IMPS); INTERFACIAL CHARGE TRANSFER; MOLYBDENUM DISELENIDE; PHOTOETCHING; PHOTORESPONSE; SCANNING MICROSCOPE FOR SEMICONDUCTOR CHARACTERIZATION (SMSC); SURFACE RECOMBINATION; TUNGSTEN DISELENIDE;

SEMICONDUCTING INTERMETALLICS;

EID: 0029678911     PISSN: 00223654     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp952001x     Document Type: Article

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