Numerical study of gasdynamics influence on three-dimensional transport phenomena in vertical zinc selenide LPCVD reactor

Materials Science and Engineering B

Volumn 39, Issue 1, 1996, Pages 8-14

  Garibin, E A ^a   Mironov, I A ^a   Khoruzhnikov, S E ^a   Vorob'ev, A N ^a  

^a ITMO UNIVERSITY   (Russian Federation)

Author keywords

Chemical vapour deposition; Gasdynamics; Zinc selenide

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; GAS DYNAMICS; MASS TRANSFER; MATHEMATICAL MODELS; NUMERICAL ANALYSIS; POLYCRYSTALLINE MATERIALS; TEMPERATURE; THREE DIMENSIONAL; TRANSPORT PROPERTIES;

CARRIER GAS FLOW RATE; LOW MACH NUMBER FLOWS; LOW PRESSURE CHEMICAL VAPOUR DEPOSITION; VERTICAL RECTANGULAR REACTOR; ZINC SELENIDE;

SEMICONDUCTING ZINC COMPOUNDS;

CHEMICAL VAPOUR; DEPOSITION; REACTORS; TWO-PHASE FLOW(GAS/SOLID;

EID: 0029673053     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/0921-5107(95)01521-3     Document Type: Article

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