SOI MOSFET design for all-dimensional scaling with short channel, narrow width and ultra-thin films

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1995, Pages 631-634

  Chan, Mansun ^a   Fung, Samuel K H ^a   Hui, Kelvin Y ^a   Hu, Chenming ^a   Ko, Ping Keung ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OXIDATION; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; ULTRATHIN FILMS;

NARROW WIDTH EFFECT; RECESSED CHANNEL TECHNOLOGY; SHORT CHANNEL EFFECT;

MOSFET DEVICES;

EID: 0029547931     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)