Effective cross-talk isolation structure for power IC applications

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1995, Pages 971-974

  Chan, Wilson W T ^a   Sin, Johnny K O ^a   Wong, S Simon ^a  

^a HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

BIPOLAR TRANSISTORS; CHARGE CARRIERS; CMOS INTEGRATED CIRCUITS; CROSSTALK; ELECTRONS; EPITAXIAL GROWTH; INTEGRATED CIRCUIT MANUFACTURE; ION IMPLANTATION; PHOSPHORUS; SEMICONDUCTING BORON; SUBSTRATES;

BORON IMPLANTATION; CROSSTALK ISOLATION STRUCTURE; PHOSPHORUS IMPLANTATION; PHOTOMICROGRAPH; POWER INTEGRATED CIRCUITS; VOLTAGE TRANSIENTS;

SOLID STATE DEVICE STRUCTURES;

EID: 0029547115     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)