SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 270, Issue 1-2, 1995, Pages 73-77

In-situ ellipsometric characterization of the electrodeposition of metal films

(4) Hilfiker, James N a Thompson, Daniel W a Hale, Jeffrey S a Woollam, John A a

a UNIVERSITY OF NEBRASKA LINCOLN (United States)

Author keywords

Deposition process; Ellipsometry; Metals

Indexed keywords

CHARACTERIZATION; DEPOSITION; ELECTRODEPOSITION; ELLIPSOMETRY; GROWTH (MATERIALS); MAGNETIC MATERIALS; METALS; NICKEL; NUCLEATION; SOLUTIONS; TRANSPARENCY;

ELLIPSOMETRIC MEASUREMENTS; GALVANOSTATIC TECHNIQUE; METAL FILMS; OPTICAL CONSTANT; SULFAMATE;

THIN FILMS;

EID: 0029546189 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/0040-6090(95)06851-1 Document Type: Article

Times cited : (8)

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2
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- Muller¹

3
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- Israel Rubinstein, Marcel Dekker, New York
- (1995) Physical Electrochemistry: Principles, Methods and Applications , pp. 393
- Gottesfeld¹ Kim² Redondo³

4
- 0003709460
- Elsevier, Amsterdam
- (1967) Fundamentals of Metal Deposition , pp. 27
- Raub¹ Muller²

5
- 0003808259
- North-Holland, Amsterdam
- (1987) Ellipsometry and Polarized Light , pp. 273
- Azzam¹ Bashara²

6
- 43949163627
- (1993) Thin Solid Films , vol.233 , pp. 32
- Greef¹

7
- 0004040706
- Academic Press, Florida
- (1985) Handbook of Optical Constants of Solids , pp. 313
- Palik¹

8
- 0019539913
- (1982) Thin Solid Films , vol.89 , pp. 249
- Aspnes¹

9
- 0026839678
- (1992) J. Electrochem. Soc. , vol.139 , pp. 711
- Streinz¹ Wagner² Kruger³ Moran⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.