Plasma etching of chromium films in the fabrication of photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2621, Issue , 1995, Pages 62-72

  Coleman, Thomas P ^a   Buck, Peter D ^a  

^a Etec Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN OF EXPERIMENTS; DRY CHROME ETCHING; PHOTOMASKS; PLASMA ETCHING;

ANISOTROPY; CHROMIUM; ETCHING; LITHOGRAPHY; OPTIMIZATION; PHOTORESISTS; PLASMA APPLICATIONS; THIN FILMS;

MASKS;

EID: 0029545518     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)