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Volumn 23, Issue 6, 1995, Pages 919-925

Microscopic High Speed Investigations of Vacuum Arc Cathode Spots

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; COPPER; CURRENT DENSITY; ELECTRIC ARCS; ELECTRON EMISSION; MICROSCOPIC EXAMINATION; PLASMAS; VACUUM;

EID: 0029535773     PISSN: 00933813     EISSN: 19399375     Source Type: Journal    
DOI: 10.1109/27.476476     Document Type: Article
Times cited : (40)

References (15)
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  • 2
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    • Daalder, J.E.1
  • 3
    • 0021508014 scopus 로고
    • Current density in arc spots
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    • Hantzsche, E.1    Jüttner, B.2
  • 4
    • 84937649792 scopus 로고
    • Current density in the cathode spot of a vacuum arc: Gradients of the temperature and concentrations of charge particles
    • Sov. Phys. Doklady, USA, vol. 30, pp. 476–478, 1985
    • I. I. Beilis, M. P. Zektser, and V. I. Rakhovskii, “Current density in the cathode spot of a vacuum arc: Gradients of the temperature and concentrations of charge particles,” Doklady Akademii Nauk SSSR, vol. 282, pp. 854–857, 1985; Sov. Phys. Doklady, USA, vol. 30, pp. 476–478, 1985.
    • (1985) Doklady Akademii Nauk SSSR , vol.282 , pp. 854-857
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  • 5
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    • Cathode spot structure and dynamics in low-current vacuum arcs
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    • (1974) J. Phys. D: Appl. Phys. , vol.7 , pp. 569-580
    • Djakov, B.E.1    Holmes, R.2
  • 6
    • 0025449483 scopus 로고
    • Critical parameters of the cathode region of a vacuum arc
    • V. I. Rakhovsky, “Critical parameters of the cathode region of a vacuum arc,” IEEE Trans. Plasma Sci., vol. 18, pp. 677–681, 1990.
    • (1990) IEEE Trans. Plasma Sci. , vol.18 , pp. 677-681
    • Rakhovsky, V.I.1
  • 7
    • 84985810498 scopus 로고
    • Investigations of the current density in the cathode spot of a vacuum arc
    • S. Anders, B. Jüttner, H. Pursch, and P. Siemroth, “Investigations of the current density in the cathode spot of a vacuum arc,” Contr. Plasma Phys., vol. 25, pp. 467–473, 1985.
    • (1985) Contr. Plasma Phys. , vol.25 , pp. 467-473
    • Anders, S.1    Jüttner, B.2    Pursch, H.3    Siemroth, P.4
  • 8
    • 0022797849 scopus 로고
    • State of the art of physical models of vacuum arc cathode spots
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    • (1987) IEEE Trans. Plasma Sci. , vol.PS-15 , pp. 481-487
    • Rakhovsky, V.I.1
  • 9
    • 57849101303 scopus 로고
    • High-current arc—A new source for high rate deposition
    • Hecht, F. Richter, and J. Hahn, Eds. Oberursel: DGM Informationsgesellschaft Verlag
    • P. Siemroth, T. Schülke, and B. Schultrich, “High-current arc—A new source for high rate deposition,” in Thin Films, G. Hecht, F. Richter, and J. Hahn, Eds. Oberursel: DGM Informationsgesellschaft Verlag, 1994, pp. 42–45.
    • (1994) Thin Films, G. , pp. 42-45
    • Siemroth, P.1    Schülke, T.2    Schultrich, B.3
  • 10
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  • 13
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    • Daalder, J.E.1
  • 14
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  • 15
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    • (1971) Appl. Phys. Lett. , vol.18 , pp. 218-220
    • Utsumi, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.