-
1
-
-
0021587257
-
Physical Mechanisms Contributing to Device Rebound
-
J.R. Schwank, P.S. Winokur, P.I. McWhorter, F.W. Sexton, P.V. Dressendorfer, and D.C. Turpin, “Physical Mechanisms Contributing to Device “Rebound”,” IEEE Trans. Nuc. Sci. 31, 1434 (1984).
-
(1984)
IEEE Trans. Nuc. Sci.
, vol.31
, pp. 1434
-
-
Schwank, J.R.1
Winokur, P.S.2
McWhorter, P.I.3
Sexton, F.W.4
Dressendorfer, P.V.5
Turpin, D.C.6
-
2
-
-
0024169251
-
Reversibility of Trapped Hole Annealing
-
A.J. Lelis, H.E. Boesch, Jr., T.R. Oldham, and F.B. McLean, “Reversibility of Trapped Hole Annealing,” IEEE Trans. Nuc. Sci. 35, 1186 (1988).
-
(1988)
IEEE Trans. Nuc. Sci.
, vol.35
, pp. 1186
-
-
Lelis, A.J.1
Boesch, H.E.2
Oldham, T.R.3
McLean, F.B.4
-
3
-
-
0024913722
-
The Nature of the Trapped Hole Annealing Process
-
A.J. Lelis, T.R. Oldham, H.E. Boesch, Jr., and F.B. McLean, “The Nature of the Trapped Hole Annealing Process,” IEEE Trans. Nuc. Sci. 36, 1186 (1989).
-
(1989)
IEEE Trans. Nuc. Sci.
, vol.36
, pp. 1186
-
-
Lelis, A.J.1
Oldham, T.R.2
Boesch, H.E.3
McLean, F.B.4
-
4
-
-
0028726796
-
Time Dependence of Switching Oxide Traps
-
A.J. Lelis and T.R. Oldham, “Time Dependence of Switching Oxide Traps,” IEEE Trans. Nuc. Sci. 41, 1835 (1994).
-
(1994)
IEEE Trans. Nuc. Sci.
, vol.41
, pp. 1835
-
-
Lelis, A.J.1
Oldham, T.R.2
-
5
-
-
0018531802
-
Electron Trapping in SiO2 at 295 and 77K
-
D.R. Young, E.A. Irene, D.J. Di Maria, R.F. De Keersmaeker, H.Z. Massoud, “Electron Trapping in SiO2 at 295 and 77K,” J. Appl. Phys. 50, 6366 (1979).
-
(1979)
J. Appl. Phys.
, vol.50
, pp. 6366
-
-
Young, D.R.1
Irene, E.A.2
Di Maria, D.J.3
De Keersmaeker, R.F.4
Massoud, H.Z.5
-
6
-
-
36549098783
-
An Electron Paramagnetic Resonance Study of Electron Injected Oxides in Metal-Oxide-Semiconductor Capacitors
-
L.P. Trombetta, G.J. Gerardi, D.J. DiMaria, and E. Tierney, “An Electron Paramagnetic Resonance Study of Electron Injected Oxides in Metal-Oxide-Semiconductor Capacitors,” J. Appl. Phys. 64, 2434 (1988).
-
(1988)
J. Appl. Phys.
, vol.64
, pp. 2434
-
-
Trombetta, L.P.1
Gerardi, G.J.2
DiMaria, D.J.3
Tierney, E.4
-
7
-
-
36449004449
-
Positive Charge Generation in Metal-Oxide-Semiconductor Capacitors
-
L.P. Trombetta, F.J. Feigl, and R.J. Zeto, “Positive Charge Generation in Metal-Oxide-Semiconductor Capacitors,” J. Appl. Phys. 69. 2512 (1991).
-
(1991)
J. Appl. Phys.
, vol.69
, pp. 2512
-
-
Trombetta, L.P.1
Feigl, F.J.2
Zeto, R.J.3
-
8
-
-
0027809459
-
Experimental Evidence of Two Species of Radiation Induced Trapped Positive Charge
-
R.K. Freitag, D.B. Brown, and C.M. Dozier, “Experimental Evidence of Two Species of Radiation Induced Trapped Positive Charge,” IEEE Trans. Nuc. Sci. 40, 1316 (1993).
-
(1993)
IEEE Trans. Nuc. Sci.
, vol.40
, pp. 1316
-
-
Freitag, R.K.1
Brown, D.B.2
Dozier, C.M.3
-
9
-
-
0028721232
-
Evidence for Two Types of Radiation-Induced Trapped Positive Charge
-
R.K. Freitag, D.B. Brown, and C.M. Dozier, “Evidence for Two Types of Radiation-Induced Trapped Positive Charge,” IEEE Trans. Nuc. Sci. 41, 1828 (1994).
-
(1994)
IEEE Trans. Nuc. Sci.
, vol.41
, pp. 1828
-
-
Freitag, R.K.1
Brown, D.B.2
Dozier, C.M.3
-
10
-
-
0027797897
-
The Role of Border Traps in High-Temperature Postirradiation Annealing Response
-
D.M. Fleetwood, M.R. Shaneyfelt, L.C. Riewe, P.S. Winokur, and R.A. Reber, Jr., “The Role of Border Traps in High-Temperature Postirradiation Annealing Response,” IEEE Trans. Nuc. Sci. 40, 1323 (1993).
-
(1993)
IEEE Trans. Nuc. Sci.
, vol.40
, pp. 1323
-
-
Fleetwood, D.M.1
Shaneyfelt, M.R.2
Riewe, L.C.3
Winokur, P.S.4
Reber, R.A.5
-
11
-
-
84937079305
-
-
and P. Balk, presented at SISC unpublished
-
K.G. Druijf, J.M.M. de Nijs, E. Druij, E.H.A. Granneman, “Evidence for Two Types of Slow States in Stressed Si-SiO2 Systems,” and P. Balk, presented at SISC 1994, unpublished.
-
(1994)
“Evidence for Two Types of Slow States in Stressed Si-SiO2 Systems,”
-
-
Druijf, K.G.1
de Nijs, J.M.M.2
Druij, E.3
Granneman, E.H.A.4
-
12
-
-
0021427238
-
Hole Traps and Trivalent Silicon Centers in Metal/Oxide/Silicon Devices
-
P.M. Lenahan and P.V. Dressendorfer, “Hole Traps and Trivalent Silicon Centers in Metal/Oxide/Silicon Devices,” J. Appl. Phys. 55, 3495 (1984).
-
(1984)
J. Appl. Phys.
, vol.55
, pp. 3495
-
-
Lenahan, P.M.1
Dressendorfer, P.V.2
-
13
-
-
49549158861
-
Oxygen Vacancy Model for the E' Center in SiO2
-
F. J. Feigl, W. B. Fowler, and K. L. Yip, “Oxygen Vacancy Model for the E' Center in SiO2,” Solid State Commun., 14, 225–229 (1974).
-
(1974)
Solid State Commun.
, vol.14
, pp. 225-229
-
-
Feigl, F.J.1
Fowler, W.B.2
Yip, K.L.3
-
14
-
-
51149208555
-
Electron Spin Resonance Observation of the Creation, Annihilation, and Charge State of the 74G Doublet in Device Oxides Damaged by Soft X-Rays
-
T. Takahashi, B.B. Triplett, K. Yokogawa, B. Kim, K. Asada, and T. Sugano, “Electron Spin Resonance Observation of the Creation, Annihilation, and Charge State of the 74G Doublet in Device Oxides Damaged by Soft X-Rays,” Appl. Phys. Lett. 51, 1334 (1987).
-
(1987)
Appl. Phys. Lett.
, vol.51
, pp. 1334
-
-
Takahashi, T.1
Triplett, B.B.2
Yokogawa, K.3
Kim, B.4
Asada, K.5
Sugano, T.6
-
15
-
-
0026185990
-
Correlation of Fixed Positive Charge and E'γ Centers as Measured via Electron Injection and Electron Paramagnetic Resonance Techniques
-
L. Lipkin, L. Rowan, A. Reisman, and CK. Williams, “Correlation of Fixed Positive Charge and E'γ Centers as Measured via Electron Injection and Electron Paramagnetic Resonance Techniques,” J. Electrochem. Soc. 138, 2050 (1991).
-
(1991)
J. Electrochem. Soc.
, vol.138
, pp. 2050
-
-
Lipkin, L.1
Rowan, L.2
Reisman, A.3
Williams, C.K.4
-
16
-
-
0022865241
-
Spatial Dependence of Trapped Holes Determined from Tunneling Analysis and Measured Annealing
-
T. R. Oldham, A. J. Lelis, and F. B. McLean, “Spatial Dependence of Trapped Holes Determined from Tunneling Analysis and Measured Annealing,” IEEE Trans. Nuc. Sci. 33, 1203–1209 (1986).
-
(1986)
IEEE Trans. Nuc. Sci.
, vol.33
, pp. 1203-1209
-
-
Oldham, T.R.1
Lelis, A.J.2
McLean, F.B.3
-
17
-
-
0020918475
-
-
J.F. Verweij and D.R. Wolters, editors, Elsevier Science Publishers B.V. (North Holland)
-
S. Manzini and A. Modelli, Insulating Films on Semiconductors, J.F. Verweij and D.R. Wolters, editors, Elsevier Science Publishers B.V. (North Holland), 1983, p. 112.
-
(1983)
Insulating Films on Semiconductors
, pp. 112
-
-
Manzini, S.1
Modelli, A.2
-
18
-
-
0008990822
-
Effects of Introducing H2 into Irradiated MOSFETs from Room Temperature to 250°C
-
edited by C.R. Helms and B.E. Deal, Plenum, New York
-
R.E. Stahlbush and A.H. Edwards, “Effects of Introducing H2 into Irradiated MOSFETs from Room Temperature to 250°C,” in the Physics and Chemistry of SiO2 and the Si/SiO2 Interface 2, edited by C.R. Helms and B.E. Deal, (Plenum, New York, 1993) p. 489.
-
(1993)
Physics and Chemistry of SiO2 and the Si/SiO2 Interface 2
, pp. 489
-
-
Stahlbush, R.E.1
Edwards, A.H.2
-
19
-
-
0016883932
-
High-Field Transport in SiO2 on Silicon Induced by Corona Charging of the Unmetallized Surface
-
Z.E. Weinberg, W.C. Johnson, and M.A. Lambert, “High-Field Transport in SiO2 on Silicon Induced by Corona Charging of the Unmetallized Surface,” J. Appl. Phys. 47, 248 (1976).
-
(1976)
J. Appl. Phys.
, vol.47
, pp. 248
-
-
Weinberg, Z.E.1
Johnson, W.C.2
Lambert, M.A.3
-
20
-
-
0008987187
-
Comparison of Interface State Buildup in MOS Capacitors Subjected to Penetrating and Nonpenetrating Radiation
-
P.S. Winokur and M.M. Sokoloski, “Comparison of Interface State Buildup in MOS Capacitors Subjected to Penetrating and Nonpenetrating Radiation,” Appl. Phys. Lett. 28, 627 (1976).
-
(1976)
Appl. Phys. Lett.
, vol.28
, pp. 627
-
-
Winokur, P.S.1
Sokoloski, M.M.2
-
21
-
-
0024890327
-
Spin Dependent Recombination: A 29Si Hyperfine Study of Radiation-Induced Pb Centers at the Si/SiO2 Interface
-
M.A. Jupina and P.M. Lenahan, “Spin Dependent Recombination: A 29Si Hyperfine Study of Radiation-Induced Pb Centers at the Si/SiO2 Interface,” IEEE Trans. Nuc. Sci. 36, 1800 (1989).
-
(1989)
IEEE Trans. Nuc. Sci.
, vol.36
, pp. 1800
-
-
Jupina, M.A.1
Lenahan, P.M.2
-
22
-
-
0028693950
-
Microscopic Nature of Border Traps in MOS Oxides
-
W.L. Warren, M.R. Shaneyfelt, D.M. Fleetwood, J.R. Schwank, P.S. Winokur, and R.A.B. Devine, “Microscopic Nature of Border Traps in MOS Oxides,” IEEE Trans. Nuc. Sci. 41, 1817 (1994).
-
(1994)
IEEE Trans. Nuc. Sci.
, vol.41
, pp. 1817
-
-
Warren, W.L.1
Shaneyfelt, M.R.2
Fleetwood, D.M.3
Schwank, J.R.4
Winokur, P.S.5
Devine, R.A.B.6
-
23
-
-
0022865241
-
Spatial Dependence of Trapped Holes Determined from Tunneling Analysis and Measured Annealing
-
T. R. Oldham, A. J. Lelis, and F. B. McLean, “Spatial Dependence of Trapped Holes Determined from Tunneling Analysis and Measured Annealing,” IEEE Trans. Nucl. Sci., NS-33, 1203–1209 (1986).
-
(1986)
IEEE Trans. Nucl. Sci.
, vol.NS-33
, pp. 1203-1209
-
-
Oldham, T.R.1
Lelis, A.J.2
McLean, F.B.3
-
24
-
-
0019612331
-
The effects of water on oxide and interface trapped charge generation in thermal SiO2 films
-
Sep.
-
F. J. Feigl, D. R. Young, D. J. DiMaria, S. Lai, and J. Calise, “The effects of water on oxide and interface trapped charge generation in thermal SiO2 films,” J. Appl. Phys., 52, pp. 5665–5682 (Sep. 1981).
-
(1981)
J. Appl. Phys.
, vol.52
, pp. 5665-5682
-
-
Feigl, F.J.1
Young, D.R.2
DiMaria, D.J.3
Lai, S.4
Calise, J.5
-
25
-
-
21544458715
-
Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon
-
D. J. DiMaria, E. Cartier, and D. Arnold, “Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon,” J. Appl. Phys., 73, 3367 (1993).
-
(1993)
J. Appl. Phys.
, vol.73
, pp. 3367
-
-
DiMaria, D.J.1
Cartier, E.2
Arnold, D.3
-
26
-
-
51149215455
-
Electron Spin Resonance Study of High Field Stressing in Metal-Oxide-Silicon Device Oxides
-
W.L. Warren and P.M. Lenahan, “Electron Spin Resonance Study of High Field Stressing in Metal-Oxide-Silicon Device Oxides,” Appl. Phys. Lett. 49, 1296 (1986).
-
(1986)
Appl. Phys. Lett.
, vol.49
, pp. 1296
-
-
Warren, W.L.1
Lenahan, P.M.2
-
27
-
-
0000361961
-
Fundamental Differences Between Thick and Thin Oxides Subjected to High Electric Fields
-
W.L. Warren and P.M. Lenahan, “Fundamental Differences Between Thick and Thin Oxides Subjected to High Electric Fields,” J. Appl. Phys. 62, 4305 (1987).
-
(1987)
J. Appl. Phys.
, vol.62
, pp. 4305
-
-
Warren, W.L.1
Lenahan, P.M.2
-
28
-
-
0026854397
-
IEEE Trans. Nuc. Sci
-
Z. Shanfield, IEEE Trans. Nuc. Sci. 39, 303 (1992).
-
(1992)
, vol.39
, pp. 303
-
-
Shanfield, Z.1
-
29
-
-
0012337293
-
Comparison of the Effects of Post-Oxidation Anneals on the Initial Properties and the Radiation Response of Rapid Thermally Proessed Oxides
-
K. Schubert, “Comparison of the Effects of Post-Oxidation Anneals on the Initial Properties and the Radiation Response of Rapid Thermally Proessed Oxides,” J. Appl. Phys. 69, 3159 (1991).
-
(1991)
J. Appl. Phys.
, vol.69
, pp. 3159
-
-
Schubert, K.1
-
30
-
-
20344388361
-
Characteristics of the Surface-State Charge (Qss) of Thermally Oxidized Silicon
-
B.E. Deal, M. Sklar, A.S. Grove, and E.H. Snow, “Characteristics of the Surface-State Charge (Qss) of Thermally Oxidized Silicon,” J. Electrochem. Soc. 114, 267 (1967).
-
(1967)
J. Electrochem. Soc.
, vol.114
, pp. 267
-
-
Deal, B.E.1
Sklar, M.2
Grove, A.S.3
Snow, E.H.4
-
31
-
-
0026400390
-
Electron Spin Resonance Study of E' Trapping Centers in SIMOX Buried Oxides
-
J.F. Conley, P.M. Lenahan, and P. Roitman, “Electron Spin Resonance Study of E' Trapping Centers in SIMOX Buried Oxides,” IEEE Trans. Nuc. Sci., 1247 (1991).
-
(1991)
IEEE Trans. Nuc. Sci.
, pp. 1247
-
-
Conley, J.F.1
Lenahan, P.M.2
Roitman, P.3
-
32
-
-
0020910298
-
Microstructural Variations in Radiation Hard and Soft Oxides Observed Through Electron Spin Resonance
-
P.M. Lenahan and P.V. Dressendorfer, “Microstructural Variations in Radiation Hard and Soft Oxides Observed Through Electron Spin Resonance,” IEEE Trans. Nuc. Sci. 30, 4602 (1983).
-
(1983)
IEEE Trans. Nuc. Sci.
, vol.30
, pp. 4602
-
-
Lenahan, P.M.1
Dressendorfer, P.V.2
-
33
-
-
0027797897
-
The Role of Border Traps in MOS High-Temperature Postirradiation Annealing Response
-
D.M. Fleetwood, M.R. Shaneyfelt, L.C. Riewe, P.S. Winokur, and R.A. Reber, Jr., “The Role of Border Traps in MOS High-Temperature Postirradiation Annealing Response,” IEEE Trans. Nuc. Sci. 40, 1323 (1993).
-
(1993)
IEEE Trans. Nuc. Sci.
, vol.40
, pp. 1323
-
-
Fleetwood, D.M.1
Shaneyfelt, M.R.2
Riewe, L.C.3
Winokur, P.S.4
Reber, R.A.5
|