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Volumn 2, Issue , 1995, Pages 190-193
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Properties of heteroepitaxial 3C-SiC films grown by LPCVD
a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
CARRIER CONCENTRATION;
CHEMICAL VAPOR DEPOSITION;
ELASTIC MODULI;
EPITAXIAL GROWTH;
FILTERS (FOR FLUIDS);
MEMBRANES;
POLYCRYSTALLINE MATERIALS;
PRESSURE EFFECTS;
ROTARY PUMPS;
SILICON WAFERS;
SINGLE CRYSTALS;
TRANSPARENCY;
LOW PRESSURE CHEMICAL VAPOR DEPOSITION;
MASS FLOW CONTROLLER;
MECHANICAL BOOSTER PUMP;
PIRANI GAUGE;
POLYCRYSTALLINE FILM;
POLYMEMBRANE;
SILICON CARBIDE;
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EID: 0029517982
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (8)
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References (7)
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