Completely planarized W plugs using MnO2 CMP

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1995, Pages 465-468

  Kishii, Sadahiro ^a   Suzuki, Rintaro ^a   Ohishi, Akiyoshi ^a   Arimoto, Yoshihiro ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASIVES; ALUMINA; CHEMICAL CLEANING; ETCHING; MANGANESE COMPOUNDS; MASS SPECTROMETRY; SCANNING ELECTRON MICROSCOPY; TUNGSTEN;

CHEMICAL MECHANICAL POLISHING; INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY; MANGANESE DIOXIDE; PLUG SCAM ETCHING; TOTAL X RAY FLUORESCENCE; TUNGSTEN PLUGS;

CHEMICAL POLISHING;

EID: 0029517849     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)