Deuterium incorporation into glow-discharge deposited deuterated-hydrogenated amorphous silicon

Materials Research Society Symposium - Proceedings

Volumn 377, Issue , 1995, Pages 87-92

  Sidhu, L S ^a   Gaspari, F ^a   O'Leary, S K ^a   Sukotynski, S ^a  

^a UNIVERSITY OF TORONTO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; DEUTERIUM; GASES; HYDROGEN; INFRARED SPECTROSCOPY; PLASMAS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; SILANES; SUBSTRATES;

FOURIER TRANSFORM INFRARED SPECTROMETER; MOLECULAR DEUTERIUM; SADDLE-FIELD ELECTRODE CONFIGURATION; SADDLE-FIELD GLOW DISCHARGE;

AMORPHOUS SILICON;

EID: 0029517042     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-377-87     Document Type: Conference Paper

References (9)