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Volumn 343, Issue 3, 1995, Pages 211-220

Electronic factors determining the reactivity of metal surfaces

a TECHNICAL UNIVERSITY OF DENMARK (Denmark)

b JT RES CENTER FOR ATOM TECHNOLOGY (Japan)

Author keywords

Alloys; Chemisorption; Copper; Density functional calculations; Hydrogen; Models of surface chemical reactions; Platinum; Surface chemical reaction

Indexed keywords

ALLOYS; CALCULATIONS; CHEMICAL REACTIONS; CHEMISORPTION; COPPER; DISSOCIATION; ELECTRON ENERGY LEVELS; ELECTRONIC DENSITY OF STATES; FERMI LEVEL; HYDROGEN; METALS; PLATINUM;

ALLOY SURFACES; ANTI-BONDING ADSORBATE STATE; BONDING ADSORBATE STATE; DENSITY FUNCTIONAL THEORY CALCULATIONS; ELECTRONIC FACTORS; HYBRIDIZATION ENERGY; METAL SURFACES; REACTIVITY; VALENCE BAND;

SURFACE PROPERTIES;

EID: 0029512476 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/0039-6028(96)80007-0 Document Type: Article

Times cited : (1989)

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