Fabrication and characterization of diamond-clad silicon field emitter arrays

Japanese Journal of Applied Physics

Volumn 34, Issue 12, 1995, Pages 6926-6931

  Cheng, Huang Chung ^a   Ku, Tzu Kun ^a   Hsieh, Biing Bang ^a   Chen, Sheng Hsiung ^a   Leu, Shye Yuh ^a   Wang, Chih Chong ^a   Chen, Chia Fu ^a   Hsieh, Iing Jar ^a,b   M Huang, Jammy C ^a,c  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b CHUNG HUA UNIVERSITY   (Taiwan)

^c INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Diamond clad Si microtips; Effective work function; Field emission; Fowler Nordheim (F N) plot; Microwave plasma CVD

Indexed keywords

CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; CURVE FITTING; DIAMOND FILMS; ELECTRIC CURRENTS; ELECTRON EMISSION; MICROELECTRONIC PROCESSING; PLASMA STABILITY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; TRANSMISSION ELECTRON MICROSCOPY;

DIAMOND CLAD SILICON FIELD EMITTER ARRAYS; EFFECTIVE WORK FUNCTION; FIELD EMISSION; FOWLER-NORDHEIM PLOT; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION;

FIELD EFFECT TRANSISTORS;

EID: 0029511006     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.34.6926     Document Type: Article

References (19)

1. P. Vaudaine and R. Meyer: Int. Electron. Device Meet. IEEE, Philadelphia (1991) p. 197.
2. C. A. Spindt, C. E. Holland, A. Rosengreen and I. Brodie: J.Vac. Sci. k Technol. B 11 (1993) 468.
3. T. H. P. Chang, D. P. Kern, et al.: J. Vac. Sci. k Technol. B 9 (1991) 438.
4. H. H. Busta, J. E. Pogemiller and B. J. Zimmerman: J.Micromech. Microeng. (1993) 45.
5. T. Utsumi: IEEE Trans. Electron Device 38 (1991) 2275.
6. H. H. Busta, D. W. Jenkins, B. J. Zimmerman and J. E.Fogeiller: Int. Electron. Device Meet. IEEE, Philadelphia (1991)p. 213.
7. R. B. Marcus, T. S. Ravi, T. Gmitter, K. Chin, W. J. Orvis, D.R. Ciarlo, C. E. Hunt and Trujillo: Appl. Phy. Lett. 56 (1990)236.
8. H. H. Busta, R. R. Shadducck and W. Orvis: IEEE Trans. Electron Device 36 (1989) 2679.
9. V. V. Zhirnov and E. I. Givargizov: J. Vac. Sci. k Technol. B12 (1994) 633.
10. F. J. Himpsel, J. A. Knapp, J. A. Van Vechten and D. E.Eastman: Phys. Rev. B 20 (1979) 624.
11. M. N. Yoder: Diamond and Diamond-Like Films and Coatings, eds. R. E. Clausing et al.: (Plenum, 1991) p. 11.
12. K. Okano, K. Hoshina, M. Lida, S. Koizumi and T. Inuzuka:Appl. Phys. Lett. 64 (1994) 2742.
13. E. I. Givargizov, V. V. Zhirnov, A. N. Stepanova, E. V. Rakova, A. N. Kiselev and P. S. Piekhanov: Appl. Sur. Sci. 87/88 (1995) 24.
14. N. Liu, Z. Ma, X. Chu, T. Hu, Z. Xue, X. Jiang and S. Pang: J.Vac. Sci. k Technol. B 12 (1994) 1712.
15. T. K. Ku, M. S. Chen, C. C. Wang, W. F. Lee, M. S. Feng, I. J.Hsieh, C. M. Huang and H. C. Cheng: Proc. Int. Sym. ElectronDevices k Materials, Taiwan, 1994, p. 11-34-136.
16. N. S. Xu, R. V. Latham and Y. Tzeng: Electron. Lett. 29(1993) 1596.
17. C. A. Spindt, I. Brodie, L. Humpnrey and E. R. Westerberg: J.Appl. Phys. 47 (1976) 5248.
18. D. W. Jenkins: IEEE Trans. Electron Devices 40 (1993) 666.
19. T. K. Ku, M. S. Chen, C. C. Wang, M. S. Feng, I. J. Hsieh, C.M. Huang and H. C. Cheng: To be published in Jpn. J. appl.Phys Part 1.