High sensitive internal film stress measurement by an improved micromachined indicator structure

International Conference on Solid-State Sensors and Actuators, and Eurosensors IX, Proceedings

Volumn 2, Issue , 1995, Pages 84-87

  Ericson, Fredric ^a   Greek, Staffan ^a   Soderkvist, Jan ^a   Schweitz, Jan Ake ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELEROMETERS; CHEMICAL VAPOR DEPOSITION; ION IMPLANTATION; MICROMACHINING; POLYCRYSTALLINE MATERIALS; REACTIVE ION ETCHING; RESIDUAL STRESSES; SEMICONDUCTING SILICON; SURFACES; THICK FILMS; THIN FILMS;

COMPRESSIVE STRESS; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MAXIMA ACCELEROMETERS; STRESS GRADIENTS; STRESS MEASUREMENT; SURFACE MICROMACHINED INDICATOR STRUCTURE; SURFACE MICROMACHINING; TENSILE STRESS;

MECHANICAL VARIABLES MEASUREMENT;

EID: 0029510956     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)