Polysilicon surface modification technique to reduce sticking of microstructures

International Conference on Solid-State Sensors and Actuators, and Eurosensors IX, Proceedings

Volumn 1, Issue , 1995, Pages 206-209

  Yee, Youngjoo ^a   Chun, Kukjin ^a   Lee, Jong Duk ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DRY ETCHING; FABRICATION; GRAIN BOUNDARIES; MICROMACHINING; MICROSTRUCTURE; POLYCRYSTALLINE MATERIALS; SUBSTRATES; SURFACE ROUGHNESS; SURFACE TENSION; SURFACE TREATMENT;

GRAIN HOLES; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MICROMECHANICAL SYSTEMS; MICROSTRUCTURE STICKING; SURFACE MICROMACHINING;

SEMICONDUCTING SILICON;

EID: 0029510929     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)