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Volumn 152, Issue 2, 1995, Pages 431-442
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The effect of surface topography on the sensitivity of lead phthalocyanine thin films to nitrogen dioxide
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS FILMS;
ATOMIC FORCE MICROSCOPY;
LIGHT ABSORPTION;
NITROGEN COMPOUNDS;
OPTICAL MICROSCOPY;
QUARTZ;
RECOVERY;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING LEAD COMPOUNDS;
SURFACE PROPERTIES;
THERMAL EFFECTS;
X RAY DIFFRACTION;
GAS SENSITIVITY;
LEAD PHTHALOCYANINE;
MONOCLINIC PHASE;
NITROGEN DIOXIDE;
OPTICAL ABSORPTION MICROSCOPY;
SURFACE TOPOGRAPHY;
TRICLINIC PHASE;
THIN FILMS;
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EID: 0029510014
PISSN: 00318965
EISSN: 1521396X
Source Type: Journal
DOI: 10.1002/pssa.2211520211 Document Type: Article |
Times cited : (12)
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References (17)
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