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Volumn 377, Issue , 1995, Pages 105-111
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Deposition of Si thin films by reactive CVD
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
FLUORINE;
GASES;
GROWTH (MATERIALS);
LOW TEMPERATURE PROPERTIES;
SEMICONDUCTING GERMANIUM COMPOUNDS;
SEMICONDUCTING SILICON;
SILANES;
GERMANIUM FLUORIDE;
LOW TEMPERATURE GROWTH;
POOR HOLE TRANSPORT CHARACTERISTICS;
PROLONGED INTENSE ILLUMINATION;
REACTIVE THERMAL CHEMICAL VAPOR DEPOSITION;
RF-GLOW DISCHARGE TECHNIQUE;
SPONTANEOUS CHEMICAL DEPOSITION;
THIN FILMS;
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EID: 0029491098
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-377-105 Document Type: Conference Paper |
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Times cited : (3)
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References (14)
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