On the morphology of porous silicon layers obtained by electrochemical method

Proceedings of the International Semiconductor Conference, CAS

Volumn , Issue , 1995, Pages 331-334

  Craciun, G ^a   Dafinei, A ^a   Vrinceanu, C ^a   Vasile, E ^a   Flueraru, C ^a  

^a NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMISTRY; ETCHING; MORPHOLOGY; POROSITY; SCANNING ELECTRON MICROSCOPY;

ETCH RATE; PORE SIZE;

POROUS SILICON;

EID: 0029490102     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)