AIDE (Angle-Implanted Drain and Emitter): A BiCMOS technology module for mixed-signal applications

Proceedings of the IEEE Bipolar/BiCMOS Circuits and Technology Meeting

Volumn , Issue , 1995, Pages 146-149

  Chen, Hung Sheng ^a   Zhao, Ji ^a   Teng, Chih Sieh ^a   Leu, Len Yi ^a  

^a NATIONAL SEMICONDUCTOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIPOLAR TRANSISTORS; INTEGRATED CIRCUIT LAYOUT; ION IMPLANTATION; SEMICONDUCTOR JUNCTIONS;

ANGLE IMPLANTED DRAIN AND EMITTER (AIDE); LARGE ANGLE TILT IMPLANTED DRAIN (LATID); LARGE ANGLE TILT IMPLANTED EMITTER (LATIE); MIXED SIGNAL APPLICATIONS;

CMOS INTEGRATED CIRCUITS;

EID: 0029485957     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)