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Volumn 38, Issue 12, 1995, Pages
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Critical dimension atomic force microscopy for 0.25-μm process development
a
a
ORANGE LABS
(France)
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Author keywords
[No Author keywords available]
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Indexed keywords
ALGORITHMS;
CMOS INTEGRATED CIRCUITS;
FACILITIES;
INTEGRATED CIRCUIT MANUFACTURE;
MEASUREMENTS;
MICROELECTRONIC PROCESSING;
PROCESS CONTROL;
PROCESS ENGINEERING;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR DEVICE STRUCTURES;
THREE DIMENSIONAL;
CRITICAL DIMENSION ATOMIC FORCE MICROSCOPY;
CRITICAL DIMENSIONS APPLICATIONS;
TIP MANUFACTURING;
TIP TO SAMPLE POSITIONING ALGORITHMS;
TRADITIONAL SEMICONDUCTOR METROLOGY METHODS;
ATOMIC FORCE MICROSCOPY;
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EID: 0029484115
PISSN: 0038111X
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Article |
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Times cited : (4)
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References (4)
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