New CoSi2 SALICIDE technology for 0.1 μm processes and below

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1995, Pages 17-18

  Wang, Q F ^a   Maex, K ^a   Kubicek, S ^a   Jonckheere, R ^a   Kerkwijk, B ^a   Verbeeck, R ^a   Biesemans, S ^a   De Meyer, K ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COBALT COMPOUNDS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SPUTTERING; SUBSTRATES; TITANIUM COMPOUNDS; X RAY DIFFRACTION;

CONVENTIONAL COBALT PROCESS; ELECTRICAL EVALUATION; FURNACE ANNEALING; SHEET RESISTANCE; SILICIDATION PROCESS;

CMOS INTEGRATED CIRCUITS;

EID: 0029483743     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)