High performance 16M DRAM on a thin film SOI

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1995, Pages 143-144

  Kim, Hyoung Sub ^a   Lee, Sang Bo ^a   Choi, Dong Uk ^a   Shim, Jae Hoon ^a   Lee, Kyu Chan ^a   Lee, Kyu Pil ^a   Kim, Ki Nam ^a   Park, Jong Woo ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTRIC BREAKDOWN; ELECTRIC INSULATORS; ION IMPLANTATION; MOSFET DEVICES; OXIDATION; PERFORMANCE; RANDOM ACCESS STORAGE; SEMICONDUCTING SILICON; SILICON WAFERS; SUBSTRATES; THIN FILMS;

DOUBLE LEVEL METAL PROCESS; LOCAL IMPLANTATION POST FIELD; SEPARATION BY IMPLANTED OXYGEN; SHMOO PLOT;

SILICON ON INSULATOR TECHNOLOGY;

EID: 0029482709     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)