Characterization of a new automated electron-beam wafer inspection system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2439, Issue , 1995, Pages 174-183

  Hendricks, Douglas ^a   Jau, Jack Y ^a   Dohse, Hans ^a   Brodie, Alan D ^a   Meisburger, Dan ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; IMAGE PROCESSING; INSPECTION; INTEGRATED CIRCUITS; SCANNING ELECTRON MICROSCOPY;

ELECTRON-BEAM WAFER INSPECTION;

SILICON WAFERS;

EID: 0029425379     PISSN: 0277786X     EISSN: None     Source Type: None    
DOI: 10.1117/12.209200     Document Type: Conference Paper

References (7)