Advanced silicon etching using high density plasmas

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2639, Issue , 1995, Pages 224-233

  Bhardwaj, J K ^a   Ashraf, H ^a  

^a Prince of Wales Ind Est ^*  (United Kingdom)

Author keywords

Dry etching; Etch mechanisms; High density plasmas; Micro machining; Silicon

Indexed keywords

ANISOTROPY; ETCHING; MICROMACHINING; PASSIVATION; PLASMAS; SEMICONDUCTING SILICON;

HIGH DENSITY PLASMAS;

MICROELECTROMECHANICAL DEVICES;

EID: 0029419192     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.221279     Document Type: Conference Paper

References (17)

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