Extremely clean sputtering process and microstructural properties of Ni-Fe films fabricated by this process

IEEE Transactions on Magnetics

Volumn 31, Issue 6, 1995, Pages 3838-3840

  Okuyama, K ^a   Shimatsu, T ^a   Kuji, S ^a   Takahashi, M ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL IMPURITIES; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; FILM PREPARATION; GRAIN SIZE AND SHAPE; METALLIC FILMS; NICKEL ALLOYS; SPUTTER DEPOSITION;

EXTREMELY CLEAN SPUTTERING; SPUTTERING MACHINE;

MAGNETIC FILMS;

EID: 0029409266     PISSN: 00189464     EISSN: 19410069     Source Type: Journal    
DOI: 10.1109/20.489789     Document Type: Article

References (4)

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2. M. Imakawa, S. Ishibashi, A. Hatashita, T. Shimatsu and M. Takahashi, The proceedings of 14th ICMFS and E-MRS Joint Colloquium Germany, 247 (1994).
3. M. Miyamoto, Y. Sumi, S. Komaki, K. Narushima and H. Ishimaru, J. Vac. Sci. Technol., A4, 2515 (1986).
4. M. Morita, T. Ohmi, E. Hasegawa, M. Kawakami and M. Ohwada, J.Appl.Phys., 68, 1272(1990).