Influence of Magnetic Anisotropy Distribution on Interactions in Co-Cr-Ta Thin Films

IEEE Transactions on Magnetics

Volumn 31, Issue 6, 1995, Pages 2800-2802

  Suzuki, Hiroyuki ^a   Kodama, Naoki ^a   Bissell, Philip R ^b   Chantrell, Roy W ^c  

^a HITACHI LTD   (Japan)

^b UNIVERSITY OF CENTRAL LANCASHIRE   (United Kingdom)

^c KEELE UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT ALLOYS; MAGNETIC ANISOTROPY; MAGNETIC FIELD EFFECTS; MAGNETIC HYSTERESIS; MAGNETIZATION; MAGNETOMETERS; MAGNETRON SPUTTERING; OXIDATION; SILICON WAFERS; SPUTTER DEPOSITION;

COBALT CHROMIUM TANTALUM; DEPOSITION RATE; IN PLANE REMANENCE; MAGNETIC ANISOTROPY DISTRIBUTION; MAGNETIC LAYER; SPUTTERING TRANSFER DIRECTION;

MAGNETIC THIN FILMS;

EID: 0029408579     PISSN: 00189464     EISSN: 19410069     Source Type: Journal    
DOI: 10.1109/20.490156     Document Type: Article

References (12)

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