Field distortion characterization using linewidth or pitch measurement

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 13, Issue 6, 1995, Pages 2904-2908

  Ye, Jun ^a   Berglund, C N ^a   Pease, R F W ^a   Owen, G ^a   Jaeger, Rolf ^a   Alexander, Katie ^a   Seeger, Judith ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; FOURIER TRANSFORMS; LITHOGRAPHY; MASKS; OPTICAL DEVICES; OPTICAL SYSTEMS; OPTICAL VARIABLES MEASUREMENT;

FIELD DISTORTION; LINEWIDTH MEASUREMENT; OPTICAL METROLOGY SYSTEM; OPTICAL STEPPERS; OVERLAY ERROR; PITCH MEASUREMENT;

ABERRATIONS;

EID: 0029406854     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588276     Document Type: Article

References (7)