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Volumn 16, Issue 11, 1995, Pages 506-508

Temperature Dependence of Gate and Substrate Currents in the CHE Crossover Regime

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL METHODS; ELECTRIC CURRENT MEASUREMENT; ELECTRIC CURRENTS; GATES (TRANSISTOR); HOT CARRIERS; SEMICONDUCTING SILICON COMPOUNDS; SUBSTRATES; THERMAL EFFECTS;

EID: 0029406134     PISSN: 07413106     EISSN: 15580563     Source Type: Journal    
DOI: 10.1109/55.468282     Document Type: Article
Times cited : (22)

References (12)
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  • 2
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    • Clear observation of sub-band gap impact ionization at room temperature and below in 0.1 µm Si MOSFET’s
    • L. Manchanda, R. H. Storz, R. H. Yan, K. F. Lee, and E. H. Westerwick, “Clear observation of sub-band gap impact ionization at room temperature and below in 0.1 µ m Si MOSFET’s,” IEDM Tech. Dig., p. 994, 1992.
    • (1992) IEDM Tech. Dig , pp. 994
    • Manchanda, L.1    Storz, R.H.2    Yan, R.H.3    Lee, K.F.4    Westerwick, E.H.5
  • 4
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    • Impact ionization at very low voltages in silicon
    • B. Eitan, D. Frohman-Bentchkowsky, and J. Shappir, “Impact ionization at very low voltages in silicon,” J. Appl. Phys., vol. 65, p. 1244, 1982.
    • (1982) J. Appl. Phys , vol.65 , pp. 1244
    • Eitan, B.1    Frohman-Bentchkowsky, D.2    Shappir, J.3
  • 5
    • 0023120899 scopus 로고
    • Substrate current at cryogenic temperatures: Measurements and a two-dimensional model for CMOS technology
    • A. K. Henning, N. M. Chan, J. P. Watt, and J. D. Plummer, “Substrate current at cryogenic temperatures: Measurements and a two-dimensional model for CMOS technology,” IEEE Trans. Electron Devices, vol. ED-37, p. 64, 1987.
    • (1987) IEEE Trans. Electron Devices , vol.ED-37 , pp. 64
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  • 6
    • 0026204658 scopus 로고
    • The impact of voltage scaling on electron heating and device performance of submicron MOSFET’s
    • F. Venturi, E. Sangiorgi, and B. Riccò “The impact of voltage scaling on electron heating and device performance of submicron MOSFET’s,” IEEE Trans. Electron Devices, vol. 38, pp. 1895–1904, 1991.
    • (1991) IEEE Trans. Electron Devices , vol.38 , pp. 1895-1904
    • Venturi, F.1    Sangiorgi, E.2    Riccò, B.3
  • 8
    • 0028532455 scopus 로고
    • The correlation between gate current and substrate current in 0.1 µm n-MOSFET's
    • H. Hu, J. Jacobs, J. E. Chung, and D. A. Antoniadis, “The correlation between gate current and substrate current in 0.1 µ m n-MOSFET's,” IEEE Electron Device Lett., vol. 15, p. 418, 1994.
    • (1994) IEEE Electron Device Lett. , vol.15 , pp. 418
    • Hu, H.1    Jacobs, J.2    Chung, J.E.3    Antoniadis, D.A.4
  • 9
    • 0028737243 scopus 로고
    • Bias and temperature dependence of gate and substrate currents in n-MOSFET's at low drain Voltage
    • D. Esseni, L. Selmi, R. Bez, E. Sangiorgi, and B. Riccò “Bias and temperature dependence of gate and substrate currents in n-MOSFET's at l ow drain Voltage,” IEDM Tech. Dig., p. 307, Dec. 1994.
    • (1994) IEDM Tech. Dig , pp. 307
    • Esseni, D.1    Selmi, L.2    Bez, R.3    Sangiorgi, E.4    Riccò, B.5
  • 10
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    • A novel method for the experimental determination of the coupling ratios in submicron EPROM and FLASH EEPROM cells
    • R. Bez, E. Camerlenghi, D. Cantarelli, L. Ravazzi, and G. Crisenza, “A novel method for the experimental determination of the coupling ratios in submicron EPROM and FLASH EEPROM cells,” IEDM Tech. Dig., p. 99, 1990.
    • (1990) IEDM Tech. Dig , pp. 99
    • Bez, R.1    Camerlenghi, E.2    Cantarelli, D.3    Ravazzi, L.4    Crisenza, G.5
  • 11
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    • Low voltage hot-electron currents and degradation in deep-submicrometer MOSFET’s
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    • Chung, J.E.1    Jeng, N.C.2    Moon, J.E.3    Ko, P K.4    Hu, C.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.