Changes in surface area and composition during grinding of silicon in environments of various quality

Journal of Materials Research

Volumn 10, Issue 11, 1995, Pages 2728-2735

  Tkáčová, Klára ^a   Števulová, Nadežda ^a   Bastl, Zdenĕk ^b   Bálintová, Magdaléna ^a  

^a INSTITUTE OF CHEMISTRY   (Slovakia)

^b J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; GRINDING (COMMINUTION); INFRARED SPECTROSCOPY; OXIDATION; PARAMAGNETIC RESONANCE; SURFACE PROPERTIES; X RAY PHOTOELECTRON SPECTROSCOPY;

DANDLING ORBITALS; OXIDE SURFACE SHELL; PARTICLE SIZE; PERMITTIVITY ORGANIC LIQUIDS; SURFACE AREA; SURFACE OXIDATION; WATER-GROUND SILICON;

SILICON;

EID: 0029405922     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/JMR.1995.2728     Document Type: Article

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