SCOPUS 정보 검색 플랫폼

Volumn 341, Issue 1-2, 1995, Pages 92-102

The interaction of azomethane with Si(100)

(4) Loh, K P a Kingsley, C R a Foord, J S a Jackman, R B b

b UNIVERSITY COLLEGE LONDON (United Kingdom)

Author keywords

Chemical vapor deposition; Chemisorption; Compound formation; Molecule solid reactions; Photoemission; Silicon; Thermal desorption

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CHEMISORPTION; DECOMPOSITION; DESORPTION; NITRIDES; ORGANIC COMPOUNDS; PHOTOEMISSION; SILICON; SILICON CARBIDE; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

AZOMETHANE; COMPOUND FORMATION; HYDROGEN CYANIDE; METHYLAMINE; MOLECULE-SOLID REACTIONS; THERMAL DESORPTION TECHNIQUES;

ADSORPTION;

EID: 0029405868 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/0039-6028(95)00752-0 Document Type: Article

Times cited : (16)

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