SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 76-77, Issue , 1995, Pages 190-196

Ion current distribution in a filtered vacuum arc deposition system

(4) Zhitomirsky, V N a Kaplan, L a Boxman, R L a Goldsmith, S a

a TEL AVIV UNIVERSITY (Israel)

Author keywords

Ion current; Magnetic coils; Plasma beam; Toroidal magnetic field; Vacuum arc deposition

Indexed keywords

ANODES; CATHODES; CURRENT DENSITY; ELECTRIC CURRENT MEASUREMENT; ELECTRIC CURRENTS; IONS; MAGNETIC FIELDS; PLASMA FLOW; PLASMAS; TIN; TITANIUM; VACUUM APPLICATIONS;

CATHODE SPOT ROTATION; FILTERED VACUUM ARC DEPOSITION; ION CURRENT DISTRIBUTION; MAGNETIC COILS; PLASMA BEAM; PLASMA DUCT; PLASMA FLOW DISTRIBUTION; TOROIDAL DUCT;

DEPOSITION;

EID: 0029405365 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/0257-8972(95)02593-6 Document Type: Article

Times cited : (48)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.