Copper Deposition onto Au(l 11) in the Presence of Thiourea

Journal of the Electrochemical Society

Volumn 142, Issue 11, 1995, Pages 3741-3749

  Hoizle, M H ^a   Apsel, C W ^a   Will, T ^a   Kolb, D M ^a  

^a UNIVERSITY OF ULM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION (PROCESS); DEPOSITION; ELECTROCHEMICAL ELECTRODES; ENTHALPY; GOLD; MONOLAYERS; NUCLEATION; SCANNING TUNNELING MICROSCOPY; SINGLE CRYSTALS;

CURRENT TRANSIENT MEASUREMENTS; ELECTROCHEMICAL MEASUREMENTS; FORMAMIDINE DISULFIDE; IN SITU SCANNING TUNNELING MICROSCOPY; OVERPOTENTIAL DEPOSITION; SATURATED CALOMEL ELECTRODE; SCANNING TUNNELING MICROSCOPY MEASUREMENTS; SINGLE CRYSTAL ELECTRODES; THIOREA; UNDERPOTENTIAL DEPOSITION;

COPPER;

EID: 0029404042     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2048407     Document Type: Article

References (56)

1. H. Fischer, Elektrolytische Abscheidung und Elek-trokristallisation von Metallen, Springer, Berlin (1954).
2. W. Plieth, Electrochim. Acta, 37, 2115 (1992).
3. M. J. Armstrong and R. H. Muller, Journal of the Electrochemical Society, 138, 2303 (1991).
4. M. Wunsche, R. J. Nichols, R. Schumacher, W. Beckmann, and H. Meyer, Electrochim. Acta, 38, 647 (1993).
5. R. J. Nichols, C. E. Bach, and H. Meyer. Ben Bunsenges. Phys. Chem., 97, 1012 (1993).
6. R. M. Rynders and R. C. Alkire, Journal of the Electrochemical Society, 141, 1166 (1994).
7. D. F. Suarez and F. A. Olson, J. Appl. Electrochem., 22, 1002 (1992).
8. J. D. Reid and A. P. David, Journal of the Electrochemical Society, 134, 1389-(1987).
9. M. Sun and T. J. O'Keefe, Metall. Trans. B, 23B, 591 (1992).
10. C. Fabricius, K. Kontturi, and G. Sundholm, Electrochim. Acta, 39, 2353 (1994).
11. S. Yoshihara, M. Ueno, Y. Nagae, and A. Fujishima, J. Electroanal. Chem., 243, 475 (1988).
12. L. A. Kuznetsova and Y. Ya. Kovarskii, Elektrokhimiya, 29, 234 (1993).
13. P. B. Rotti and B. S. Sheshadri, B. Electrochem., 3, 305 (1987).
14. D. P. Bhatt, T. Twomey, W. Plieth, R. Schumacher, and H. Meyer, J. Electroanal. Chem., 322, 279 (1992).
15. J. W. White and H. D. Abruna, J. Electroanal., 300, 521 (1991).
16. D. M. Kolb, in Advances in Electrochemistry and Electrochemical Engineering, Vol. 11, H. Gerischer and C. W. Tobias, Editors, p. 125, Wiley, New York (1978).
17. A. Szymaszek, J. Biemat, and L. Pajdowski, Electrochim. Acta, 22, 359 (1977).
18. O. Dusart, A. Sahel, and J. P. Roche, Analusis, 18, 45 (1990).
19. R. Holze and S. Schomaker, Electrochim. Acta, 35, 613 (1990).
20. U. V. Palm, Yu. I. Erlikh, and T. E. Erlikh, Elektrokhimiya, 10, 1180 (1974).
21. R. Parsons and M. C. Symons, Trans. Faraday Soc., 64, 1074 (1968).
22. M. Milkowska, Electrochim. Acta, 33, 161 (1988).
23. V. A. Zakharov, I. M. Bessarabova, O. A. Songina, and M. A. Timoskin, Elektrokhimiya, 7, 1215 (1971).
24. H. Wroblowa and M. Green, Electrochim. Acta, 8, 679 (1963).
25. D. Dickertmann, F. D. Koppitz, and J. W. Schultze, Electrochim. Acta., 21, 967 (1976).
26. T. Will, M. Dietthrle and D. M. Kolb, in Nanoscale Probes of the Solid-Liquid Interface, A. A. Gewirth and H. Siegenthaler, Editors, Vol. E288, p. 137, Nato-ASI, Kluwer, Dordrecht (1995).
27. Y. Nakai, M. S. Zei, D. M. Kolb, and G. Lehmpfuhl, Ber. Bunsenges Phys. Chem., 88, 340 (1984).
28. M. S. Zei, G. Qiao, G. Lehmpfuhl, and D. M. Kolb, Ber. Bunsenges Phys. Chem, 91, 349 (1987).
29. O. M. Magnussen, J. Hotlos, G. Beitel, D. M. Kolb, and R. J. Behm, J. Vac. Sci. Technol., B9, 969 (1991).
30. O. R. Melroy, M. G. Samant, G. L. Borges, J. G. Gordon, L. Blum, J. H. White, M. Arbarelli, M. McMillan, and H. D. Abrufia, Langmuir, 4, 728 (1988).
31. G. L. Borges, K. K. Kanazawa, J. G. Gordon, K. Ashley, and J. Richer, J. Electroanal. Chem., 364, 281 (1994).
32. S. Manne, P. K. Hansma, J. Massie, V. B. Elings, and A. A. Gewirth, Science, 251, 183 (1991).
33. M. H. Holzle, U. Retter, and D. M. Kolb, J. Electroanal. Chem., 371, 101 (1994).
34. D. A. Huckaby and L. Blum, J. Electroanal. Chem., 315, 275 (1991).
35. L. Blum, M. Legault, and P. Turq, J. Electroanal. Chem., 379, 35 (1994).
36. M. H. Holzle, V. Zwing, and D. M. Kolb, Electrochim. Acta, 40, 1237 (1995).
37. T. Hachiya, H. Honbo, and K. Itaya, J. Electroanal. Chem., 315, 275 (1991).
38. Z. Shi and J. Lipkowski, J. Electroanal. Chem., 365, 303 (1994).
39. D. B. Parry, M. G. Samant, H. Seki, M. R. Philpott, and K. Ashley, Langmuir, 9, 1878 (1993).
40. Z. Shi and J. Lipkowski, J. Electroanal. Chem., 364, 289 (1994).
41. B. Scharifker and G. Hills, Electrochim. Acta, 28, 879 (1983).
42. Southampton Electrochemistry Group, Instrumental Methods in Electrochemistry, Chap. 9, Ellis Horwood, London (1985).
43. N. Batina, T. Will, and D. M. Kolb, Faraday Discuss., 94, 93 (1992).
44. A. S. Dakkouri, N. Batina, and D. M. Kolb, Electrochim. Acta, 38, 2467 (1993).
45. D. M. Kolb, Schering Lecture's Publications, Vol. 2, Schering Research Foundation, Berlin (1991).
46. J. T. Hinatsu and F. R. Foulkes, Journal of the Electrochemical Society, 136, 125 (1989).
47. G. W. Tindall and S. Bruckenstein, Anal. Chem., 40, 1404 (1968).
48. R. Philipp and U. Retter, Thin Solid Films, 207, 42 (1992).
49. M. Y. Abyaneh and M. Fleischmann, J. ElectroanaL Chem., 119, 187 (1981).
50. K. Ebert and H. Ederer, Computer Applications in Chemistry, Chap. 11, VCH, New York (1985).
51. E. B. Budewski, in Comprehensive Treatise of Electrochemistry, Vol. 7, B. E. Conway, J. O'M. Bockris, E. Yeager, S. U. H. Khan, and R. E. White, Editors, Chap. 7, Plenum Press, New York (1987).
52. A. Milchev, S. Stoyanov, and R. Kaischev, Thin Solid Films, 22, 255 (1974)
53. A. Milchev, S. Stoyanov, and R. Kaischev, Thin Solid Films, 22, 267 (1974).
54. P. M. Rigano, C. Mayer, and T. Chierchie, J. ElectroanaL Chem., 284, 219 (1988).
55. A. Milchev, Electrochim. Acta, 28, 947 (1983).
56. R. Lacmann and H.-J. Randig, J. Cryst. Growth, 17, 97 (1972).