High Coercivity γ-(Fe,Co,Mn)2O3 Thin Films for Magnetic Recording

IEEE Transactions on Magnetics

Volumn 31, Issue 6, 1995, Pages 2785-2787

  Chang, W D ^a   Chin, T S ^a   Tu, S C ^a   Li, B H ^a   Wu, H S ^a   Jou, J H ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

COERCIVE FORCE; FERRITES; INTERFACES (MATERIALS); MAGNETIC ANISOTROPY; MAGNETIC RECORDING; MAGNETOMETERS; MAGNETRON SPUTTERING; OXIDATION; PRESSURE EFFECTS; SEMICONDUCTING SILICON; SPUTTER DEPOSITION; X RAY CRYSTALLOGRAPHY;

COBALT OXIDE; COERCIVITY ENHANCEMENT; IRON OXIDE; MANGANESE OXIDE; OXYGEN PARTIAL PRESSURE;

MAGNETIC THIN FILMS;

EID: 0029403382     PISSN: 00189464     EISSN: 19410069     Source Type: Journal    
DOI: 10.1109/20.490151     Document Type: Article

References (7)

1. 2 media: Challenges”, IEEE Trans. Magn., vol.28, pp. 3078–3083, September 1992.
2. T.C. Arnoldussen, “Thin-film recording media”, Proc. of IEEE, vol. 74, pp. 1526–1539, November 1986.
3. O. Ishii, F. Yoshimura and S. Ohara, “High coercivity sputter-deposited maghemite thin-film disk”, IEEE Trans. Magn., vol. 23, pp. 1985–1994, July 1987.
4. 3 thin films for high density recording”, IEEE Trans. Mang., vol. 29, pp. 3682–3684, November 1993.
5. 3 thin films”, J.Appl.Phys., vol. 77, pp. 1184–88, 1995.
6. S. Chikazumi, Physics of Magnetism, 1st ed., New York: John-Wiley and Sons, 1964, Ch. 17.
7. 3”, J.Appl.Phys., vol. 73, pp. 5888–5890, 1994.