Critical test of the c-BN sputter model

Surface and Coatings Technology

Volumn 74-75, Issue PART 2, 1995, Pages 723-728

  Reinke, S ^a   Kuhr, M ^a   Kulisch, W ^a  

^a UNIVERSITY OF KASSEL   (Germany)

Author keywords

Cubic boron nitride; Ion assisted deposition; Selective sputtering; Sputter yields

Indexed keywords

CUBIC BORON NITRIDE; DESORPTION; ION BEAMS; MECHANICAL VARIABLES MEASUREMENT; MODELS; REMOVAL; SPUTTER DEPOSITION; STOICHIOMETRY; STRESSES;

COMPRESSIVE STRESS; CUBIC BORON NITRIDE FILMS; FILM STOICHIOMETRY; ION-ASSISTED DEPOSITION; MATERIAL REMOVAL; SELECTIVE SPUTTERING; SPUTTER MODEL; SPUTTER YIELDS;

CERAMIC COATINGS;

EID: 0029389523     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(95)08271-9     Document Type: Article

References (30)

1. Proc. 7th Conf. on SMT
2. Effects of Ar ion beam bombardment on the formation of cubic BN in IBED
3. Characterization of BN Thin Films Deposited by Plasma CVD
4. Effects of the substrate bias on the formation of cubic boron nitride by inductively coupled plasma enhanced chemical vapor deposition