Artificial Cr- and Fe-Oxide Passive Layers Prepared by Sputter Deposition

Journal of the Electrochemical Society

Volumn 142, Issue 9, 1995, Pages 3067-3072

  Vuoristo, P ^b   Mantyla T ^b   Bohni H ^a  

^a ETH ZURICH   (Switzerland)

^b TAMPERE UNIVERSITY OF TECHNOLOGY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM OXIDE; DEFECT STRUCTURE; MOTT SCHOTTKY ANALYSIS; PHOTOELECTROCHEMISTRY;

ADSORPTION; COMPOSITION; ELECTROCHEMISTRY; ENERGY GAP; IONS; IRON OXIDES; METALLIC FILMS; PH; SPUTTER DEPOSITION; STOICHIOMETRY;

OXIDES;

EID: 0029378602     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2048689     Document Type: Article

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