The Effect of Adding Hexafluoroacetylacetone on Chemical Vapor Deposition of Copper Using Cu(I) and Cu(II) Precursor Systems

Journal of the Electrochemical Society

Volumn 142, Issue 9, 1995, Pages 3173-3179

  Awaya, Nobuyoshi ^a   Ohno, Kazuhide ^a   Arita, Yoshinobu ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACETONE; ADDITION REACTIONS; CHEMICAL VAPOR DEPOSITION; ELECTRIC INSULATORS; HYDROGEN; NUCLEATION; REDUCTION; SUBSTRATES;

BETA-KETONATE PRECURSORS; CATALYTIC REAGENT; HEXAFLUOROACETYLACETONE;

COPPER;

EID: 0029375618     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2048707     Document Type: Article

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