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Volumn 5, Issue 3, 1995, Pages 209-218
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Inhibition of pyramid formation in the etching of Si p(100) in aqueous potassium hydroxide-isopropanol
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Author keywords
[No Author keywords available]
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Indexed keywords
ALKALINE SOLUTIONS;
AQUEOUS POTASSIUM HYDROXIDE-ISOPROPANOL;
CHEMICAL REAGENTS PURITY;
DISSOLVED GASES;
HYDROGEN BUBBLE FORMATION;
MICROPYRAMIDS;
PITS;
ANISOTROPY;
BUBBLE FORMATION;
CHEMICAL REACTIONS;
DEFECTS;
ETCHING;
HYDROGEN;
MICROMACHINING;
OXYGEN;
SEMICONDUCTING SILICON;
SOLUTIONS;
SURFACE ROUGHNESS;
THREE DIMENSIONAL;
SEMICONDUCTOR DEVICE MANUFACTURE;
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EID: 0029373771
PISSN: 09601317
EISSN: None
Source Type: Journal
DOI: 10.1088/0960-1317/5/3/002 Document Type: Article |
Times cited : (111)
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References (10)
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